LightSmyth’s ultra-high efficiency reflection gratings are designed for
use in telecom polarizatire fabricated using projection lithography and
reactive-ion-etch on a single-crystal-silicon substrate and metalized (gold for
IR) to achieve very high efficiency for a single polarization. Each grating is
a master, not a replica, resulting in low scattered light and long lasting
performance. Wafer-scale cost-effective fabrication allows us to offer very
competitive prices.
Advantages:
Ultra-high efficiency for a single polarization
Robust dielectric materials, no polymers are used
Each grating is a master; ultra-low scatter
Highly competitive pricing; Telcordia-qualified
Applications:
Optical telecommunications (laser sources, polarization diversity
systems)
High power lasers
Tunable lasers
产品列表：
Telecom Reflection Gratings |
P/N | Line Density (Lines/ mm) | Line Density Uniformity (Lines/mm) | Angle of Incidence (°) | Wavefront
(@1545 nm λ2) | Thickness | Substrate Material |
SLG-C12 | 1200 | 0.001 | 68+1 | | 0.68+0.050 | Silicon |
STG-C12 | 1200 | | | <0.2 | 5.7+0.1 | Fused silica |
SLG-C11.7 | 1169.59 | 0.001 | 65+1 | | 0.68+0.050 | Silicon |
STG-C11.7 | 1169.59 | | | <0.2 | 5.7+0.1 | Fused silica |
Notes: | 1 P-polarization: E vector is perpendicular to the grating line |
| 2 Over 25×12 mm aperture |
| 3 Better tolerances and surface quality available for custom products |
| The following parameters apply to SLG-12 and SLG-11.7 products:
– Wavelength Range (in vacuum) = 1525-1565 nm
– Operational Polarization1 = P-
– Diffraction Efficiency = >90%
– Coating = Gold
– Technology = lithographic patterning, reactive ion etch
– Width and Height Tolerance3 = +0.2 mm
– Grating clear aperture (CA) = Centered, 0.5 mm from substrate edges
– Surface quality in CA = 60/40 scratch/dig |