The DE400D Thermal Evaporator is assembled with multiple thermal evaporation source, the substrate is mounting on
the top of the chamber and rotary or on the horizontal axial on the side of chamber for the substrate polar to change the
deposition angle
Configuration
Evaporation Chamber | 304 stainless steel chamber with viewport |
Vacuum Pumping | Cryo-pump or Turbo pump and dry rough pump |
Vacuum Valve | Pneumatic HV gate valves |
Evaporation Source | Multiple thermal evaporation source |
Optional Load Lock chamber | 304 stainless steel chamber with viewport |
Sample Stage | Top mount and rotary or Side mount polar Substrate |
Film Control | Crystal Film thickness Monitor and Control |
Vacuum Gauging | Wide range vacuum gauge and rough gauge |
Specification
The Base Vacuum Pressure | Better than 3E-8 Torr |
Sample Loading Capacity | One Max. 8 inch flat substrate or multi small substrate |
Max. Evaporation Temperature | 2732°F |
Rate Resolution | 0.05 Angstroms/sec |
Thickness Resolution = 0.02 Angstroms | 0.02 Angstroms |
Features D shape Chamber of front open door for easy inside operation Stand along system frameworks and electric rack The deposition process can be accurately controlled by source temperatureor film thickness control Optional Substrate Cooling or heating |
Typical Application
For R&D Thin Film Deposition
Ideal tools for LIFT-OFF process
Ideal tools for GLAD process with side mount substrate stage
Evaporate metal, Semiconductor or Insulation Materials (material depends)
来宝会员