The DE400 Electron Beam Evaporator is assembled with one e-beam source, the substrate is mounting on the horizontal axial on the side of chamber for the substrate polar to change the deposition angle.
Configuration
Evaporation Chamber | 304 stainless steel chamber with viewport |
Vacuum Pumping | Cryo-pump or Turbo pump and dry rough pump |
Vacuum Valve | Pneumatic UHV gate valves |
Evaporation Source | Multi pocket e-beam source |
Substrate Chamber | 304 stainless steel chamber with viewport |
Sample Stage | Side mount polar Substrate |
Film Control | Crystal Film thickness Monitor and Control |
Vacuum Gauging | Wide range vacuum gauge and rough gauge |
Specification
The Base Vacuum Pressure | better than 9E-9 Torr |
Sample Loading Capacity | One Max. 4 inch flat substrate |
Rate Resolution | 0.05 Angstroms/sec |
Thickness Resolution = 0.02 Angstroms
| 0.02 Angstroms |
Features
Unique Design of Substrate Chamber and Sources chamber isolated by UHV gate valve
All Metal Seal, True UHV System
Stand along system frameworks and electric rack
E-beam source Water Interlock
Optional Substrate Cooling
Typical Application
For R&D Thin Film Deposition
Ideal tools for LIFT-OFF process
Ideal tools for GLAD process
Evaporate metal, Semiconductor or Insulation Materials (material depends)
Evaporate Magnetic Materials
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