DE400 Vacuum Metal/OLED Evaporation
System The DE400 Vacuum METAL/OLED Evaporation System is assembled with multi
thermal evaporation sources to evaporate thin film on up to 4” x 4” substrate,
it can be used to evaporate metal, semiconductor or insulation materials and
OLED, it can be used to co-EVP or deposition multi layer thin films. Configuration
Evaporation Chamber | 304 stainless steel chamber with viewport | Vacuum Pumping | Maglev Turbo pump and dry rough pump | Vacuum Valve | Pneumatic gate valve | Vacuum Gauging | Wide range vacuum gauge and
rough gauge | Evaporation
Source | Multiple High Temperature thermal evaporation sources Multiple low temperature thermal evaporation
sources | Substrate fixture | Accept 4” x 4” substrate or multi smaller | Film Control | Crystal Film thickness Monitor and Control | Glove Box | Option Glove Box |
Specification The Base Vacuum Pressure | better than 3E-7 Torr | Sample Loading Capacity | Max. 4x4 inch flat substrate | Rate Resolution | 0.05 Angstroms/sec | Thickness Resolution = 0.02 Angstroms | 0.02 Angstroms |
Features
Unique Design of Chamber with front
and back open door All Metal Seal except o-ring
sealing door Deposition can be accuracy
controlled by temperature or by Crystal control Optional Substrate heating
Typical Application
For R&D Thin Film Deposition
Ideal tools for LIFT-OFF
process Evaporate metal, Semiconductor or
Insulation Materials and OLED | 
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